منابع مشابه
Resists, Developers and Removers
Positive resists form an indene carboxylic acid during exposure making them soluble in aqueous alkaline solutions. Therefore, positive resists develop where they have been exposed, while the unexposed areas remain on the substrate. Since positive resists do not cross-link, the resist structures rounden beyond their softening point of typically 100-130°C. Negative resists such as the AZ® nLOF 20...
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What would be today's programming language of choice for distributed computing in the Internet? Few would doubt that it should be Java [Arnold/Gosling 96], given its platform independence and the possibility of loading Java applets over the network. So if the prophets and the faithful are right, the basic design and the special features of Java should make distributed programming easy for the e...
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Your use of the JSTOR archive indicates your acceptance of JSTOR's Terms and Conditions of Use, available at http://www.jstor.org/page/info/about/policies/terms.jsp. JSTOR's Terms and Conditions of Use provides, in part, that unless you have obtained prior permission, you may not download an entire issue of a journal or multiple copies of articles, and you may use content in the JSTOR archive o...
متن کاملSincere-Strategy Preference-Based Approval Voting Fully Resists Constructive Control and Broadly Resists Destructive Control
We study sincere-strategy preference-based approval voting (SP-AV), a system proposed by Brams and Sanver [1] and here adjusted so as to coerce admissibility of the votes (rather than excluding inadmissible votes a priori), with respect to procedural control. In such control scenarios, an external agent seeks to change the outcome of an election via actions such as adding/deleting/partitioning ...
متن کاملChemical Amplification Resists for Future Lithography
The technologies for future lithography have been proposed, such as i-line phase-shifting lithography, deep-UV lithography and electron beam lithography. We have proposed several types of chemical amplification resist systems for future lithography. These are based on the change in dissolution rate by acid catalyzed reaction for aqueous development: dissolution inhibitor to dissolution promoter...
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ژورنال
عنوان ژورنال: Journal of Anthropological Films
سال: 2021
ISSN: 2535-437X
DOI: 10.15845/jaf.v5i01.3209